Reductive nanometric patterning of graphene oxide paper using electron beam lithography

Gil Gonçalves TEMA-NRD, Mechanical Engineering Department, University of Aveiro
Jérôme Borme INL – International Iberian Nanotechnology Laboratory
Igor Bdkin TEMA-NRD, Mechanical Engineering Department, University of Aveiro
Ankor González-Mayorga Hospital Nacional de Parapléjicos (HNP), Servicio de Salud de Castilla-La Mancha (SESCAM)
Gonzalo Irurueta TEMA-NRD, Mechanical Engineering Department, University of Aveiro
Helena I. S. Nogueira CICECO, Department of Chemistry, University of Aveiro
María C. Serrano Instituto de Ciencia de Materiales de Madrid (ICMM-CSIC); Materials Science Factory, ICMM-CSIC; Joint Research Unit “Design and Development of Biomaterials for Neural Regeneration”, HNPSESCAM, Joint Research Unit with CSIC
Pedro Alpuim INL – International Iberian Nanotechnology Laboratory; Instituto de Ciencia de Materiales de Madrid (ICMM-CSIC); CFUM-Center of Physics of the University of Minho
Paula A. A. P. Marques TEMA-NRD, Mechanical Engineering Department, University of Aveiro

No abstract available.